FluoroPFA® Filter Cartridges

FluoroPFA® Filter Cartridges

All-Polyfluorene Filter

Hall Pyke FluoroPFA® Filter Cartridges utilize expanded PTFE membranes and PFA core & cage to meet critical filtration requirements in extremely aggressive environments. PFA Filters remain strong and durable in aggressive acids, bases, and organic compounds. In addition, hydrophilic PTFE membranes require no pre-wetting.

Features and Benefits

All-fluoropolymer material of construction provides superior resistance during chemical processing and pulsing.
Excellent chemical compatibility.
High temperature and pressure capabilities.
Very high flow rates with low differential pressure.
Low extractable.
High particle removal efficiency.
Manufactured in a clean room environment.

Categories / Industries:
Chemicals and Coatings, Dairy, Food and Beverage, Pharmaceutical, Surface Pre Filtration, Utilities, Water Treatment

Details

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Description

Typical Applications

Highly corrosive Acids, such as Hydrofluoic Acid, Nitric Acid and Sulfric Acid.
High Temperatures Chemical Liquid (>100°C).
Aggressive Solvents, such as Chloroform, Two methyl, Isopropyl Alcohol.
Aggressive Bases.
Oxidizing Air/Gas.

Materials of Construction

Filter Media	PTFE Membrane
Support Layer	PFA
Core/Cage/End Caps	PFA
O-rings	Teflon™ Encapsulated Viton™
Effective Filtration Area	0.7m²/Φ68mm 10 inch
Effective Filtration Area	1.5m²/Φ83mm 10 inch
Max.Operating Temperature	170°C
Max.Differential Pressure	4bar/50°C
	3bar/110°C
	1.5bar/170°C

Removal Ratings

1.0μm, 3.0μm, 5.0μm, 10μm

Chemical Compatibility

Chemical	EPP Series	PFA Series	APTF Series	AET Series	LPF Series
Acetic Acid (10%)	G	E	E	E	E
Hydrofluoric Acid (50%)	G	E	E	E	E
Hydrogen Peroxide (30%)	LR	E	G	LR	G
Nitric Acid (conc.)	NR	E	NR	NR	NR
Phosphoric Acid (conc.)	LR	E	G	E	G
Sulfuric Acid (conc.)	NR	E	NR	LR	LR
Ammonium Hydroxide (conc.)	G	E	NR	NR	E
Potassium Hydroxide (conc.)	G	E	NR	LR	E
Sodium Hydroxide (conc.)	G	E	NR	LR	E
TMAH (5%)	G	E	NR	G	E
Aqua Ragia HNO₃:HCL	NR	E	NR	LR	NR
BEO; NH₄F:HF	G	E	E	G	G
Mixed Acid Etch HNO₃ < 20% (HNO₃: HF:CH₃CO₂H)	LR	E	LR	LR	LR
Chrom Phos (H₂O:H₃PO₄:CRO₃)	LR	E	G	G	G
N-Methyl Pyrrolidone	LR	E	NR	G	G
Piranha (H₂SO₄O₂)	NR	E	NR	LR	NR
RCAEtch	NR	E	G	G	G
SC1 (RCA Clean)	NR	E	NR	LR	LR
SC2	NR	E	NR	LR	LR
E = Excellent	G = Good at Ambient Temperatures		LR = Limited Resistance		NR = Not Recommended
The above data is to be used as a guide only. Testing prior to application is recommended.